Method for controlling a recess etch process

@inproceedings{J2003MethodFC,
  title={Method for controlling a recess etch process},
  author={安德鲁·J·佩里 and 维贾雅库马尔·C·韦努戈帕尔},
  year={2003}
}
The method of controlling a kind of recess etching processes of a multilayered columnar substrate material for the deposition, and the channel containing the channel, the method comprising: obtaining the net reflected by the measurement of at least a portion of the channel comprises a substrate spectrum, determining a first reference point from the size of the substrate surface into the substrate; weighted incoherent reflectance calculated from n≥1 different regions constituting the portion of… CONTINUE READING

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