Method and system for modifying photoresist using electromagnetic radiation and ion implantion

@inproceedings{2011MethodAS,
  title={Method and system for modifying photoresist using electromagnetic radiation and ion implantion},
  author={고데 루도빅 and 마틴 패트릭엠.},
  year={2011}
}
Method for reducing the surface roughness (surface roughness) of the resist features (resist feature) disposed on a substrate includes the step of generating a plasma having a plasma sheath and the ion therein. The shape of the border (boundary) between the plasma and the plasma sheath is changed by using the plasma sheath modifier (plasma sheath modifier), is not a part of the boundary is parallel to a plane defined by the substrate. During the first exposure, resist features is exposed to… CONTINUE READING

Similar Papers