Metal Oxide Thin Films Deposited from Metal Organic Precursors in Supercritical CO2 Solutions

@inproceedings{Gougousi2005MetalOT,
  title={Metal Oxide Thin Films Deposited from Metal Organic Precursors in Supercritical CO2 Solutions},
  author={Theodosia Gougousi and Dipak Barua and Erin D. Young and Gregory N. Parsons},
  year={2005}
}
This work demonstrates a novel method for deposition of metal oxide thin films, including Al2O3, ZrO2, MnOx, and RuOx where the metal−organic precursors and oxidizing agents are delivered in liquid and supercritical CO2. A cyclic deposition process is presented where reactants are introduced sequentially to control surface adsorption and byproduct removal steps. Reactions are studied in a hot wall reactor at pressures ranging from 1600 to 3600 psi at 80−200 °C, and X-ray photoelectron… CONTINUE READING

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