Measurement of photoresist grating profiles based on multiwavelength scatterometry and artificial neural network.

@article{Wei2008MeasurementOP,
  title={Measurement of photoresist grating profiles based on multiwavelength scatterometry and artificial neural network.},
  author={Shiming Wei and Lifeng Li},
  journal={Applied optics},
  year={2008},
  volume={47 13},
  pages={2524-32}
}
We employed a grating profile measurement method, which is based on the combination of multiwavelength scatterometry and artificial neural network, to determine the critical dimensions of submicrometer-period photoresist gratings with wavy sidewall profiles. Six laser beams in three wavelengths and two orthogonal polarizations were adopted for the scatterometry measurement, and the incident angle of each beam was chosen following principles that we propose for achieving high sensitivity. We… CONTINUE READING