Masterless soft lithography: patterning UV/ozone-induced adhesion on poly(dimethylsiloxane) surfaces.

@article{Childs2005MasterlessSL,
  title={Masterless soft lithography: patterning UV/ozone-induced adhesion on poly(dimethylsiloxane) surfaces.},
  author={William R Childs and Michael J. Motala and Keon Jae Lee and Ralph G. Nuzzo},
  journal={Langmuir : the ACS journal of surfaces and colloids},
  year={2005},
  volume={21 22},
  pages={10096-105}
}
A novel microreactor-based photomask capable of effecting high resolution, large area patterning of UV/ozone (UVO) treatments of poly(dimethylsiloxane) (PDMS) surfaces is described. This tool forms the basis of two new soft lithographic patterning techniques that significantly extend the design rules of decal transfer lithography (DTL). The first technique, photodefined cohesive mechanical failure, fuses the design rules of photolithography with the contact-based adhesive transfer of PDMS in… CONTINUE READING
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