Mass Production of Room Temperature Single Electron Transistors using Step & Flash Imprint Lithography and Lift-Off Technique

We report the use of step & flash imprint lithography reverse tone (SFIL-RTM) and liftoff technique to fabricate sub-100 nm metal nano-wires as the electrodes for room temperature single electron transistors (RT-SET). The optimized process flow was performed on approximately 300 imprints, for a total of 714,000 devices. Each imprinted device contains drain… CONTINUE READING