Manipulation of exposure dose parameters to improve production of high aspect ratio structures using SU-8

@inproceedings{Daunton2012ManipulationOE,
  title={Manipulation of exposure dose parameters to improve production of high aspect ratio structures using SU-8},
  author={Rachael Hannah Daunton and Andrew J. Gallant and David W. Wood},
  year={2012}
}
The detailed consideration of the chemistry occurring during the fabrication process is very important for SU-8 compared to other photoresists. In SU-8, the solvent does far more than just act as a carrier for the photoactive compounds: it plays a prominent role in the processing chemistry. In this paper we explain how the change of solvent from old to new formulations of SU-8 has an effect on the processing of this resist. We then show how, and why, in the modern 2000 series formulations the… CONTINUE READING