Magnetic and Electrical Properties of Epitaxial NiFe2O4 (001) Films Fabricated by Reactive Sputtering

Abstract

Thin films of NiFe2O4 were fabricated on MgO (001) and MgAl2O4 (MAO) (001) substrates by reactive radio frequency magnetron sputtering and were evaluated with regards to their electrical and magnetic properties. A saturation magnetization of 285 emu/cm3 was obtained with a 30 nm thick film grown on an MAO substrate at an oxygen flow rate, Q, of 9 sccm. This… (More)

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