Magnetic Properties of Fe-Si Sputtered Films

@article{Suwabe1987MagneticPO,
  title={Magnetic Properties of Fe-Si Sputtered Films},
  author={S. Suwabe and Migaku Takahashi and Tetsu Tanaka and T. Wakiyama},
  journal={IEEE Translation Journal on Magnetics in Japan},
  year={1987},
  volume={2},
  pages={243-245}
}
A detailed investigation of the relation between the differences in Fe-Si film structure governing its soft magnetic properties and film magnetic properties is discussed. The absolute values of Hc showed extreme variation with different growth conditions. The composition for which Hc was minimal was 7 to 8 wt% Si at 3.5 kV, but at 2.0 kV it was displaced to… CONTINUE READING