MICROTEXTURE AND HARDNESS OF CVD DEPOSITED α-Al2O3 and TiCxN1-x COATINGS

@inproceedings{Chien2009MICROTEXTUREAH,
  title={MICROTEXTURE AND HARDNESS OF CVD DEPOSITED α-Al2O3 and TiCxN1-x COATINGS},
  author={H. K. Chien and Michael C. Gao and H. Morgan Miller and Gregory S Rohrer and Zhigang Ban and Paul Dehnhardt Prichard and Yixiong Liu},
  year={2009}
}
The microstructures of chemical vapor deposited coatings on four tool inserts have been comprehensively characterized using electron backscatter diffraction mapping. Nanoindentation was used to measure the hardness of the TiCxN1-x and α-Al2O3 layers in each coating. The TiCxN1-x layers have weak [112] or [101] textures in the growth direction and are highly twinned. In these layers, coherent twins make up 13 % to 20 % of the total grain boundary length. The alumina layers have € [101 4]or [0001… CONTINUE READING

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