• DOI:10.1117/12.814025
• Corpus ID: 173181588

MAPPER: high-throughput maskless lithography

@inproceedings{Wieland2009MAPPERHM,
  title={MAPPER: high-throughput maskless lithography},
  author={Marco Jan-Jaco Wieland and Guido de Boer and G. F. ten Berge and Remco Jager and T. van de Peut and Jerry Johannes Martinus Peijster and Erwin Slot and Stijn Steenbrink and T. F. Teepen and A. H. V. van Veen and B. J. Kampherbeek},
  booktitle={Advanced Lithography},
  year={2009}
}

• M. Wieland, G. de Boer, +8 authors B. Kampherbeek
• Published in Advanced Lithography 2009
• Physics

Maskless electron beam lithography, or electron beam direct write, has been around for a long time in the semiconductor industry and was pioneered from the mid-1960s onwards. This technique has been used for mask writing applications as well as device engineering and in some cases chip manufacturing. However because of its relatively low throughput compared to optical lithography, electron beam lithography has never been the mainstream lithography technology. To extend optical lithography double patterning, as a bridging technology, and EUV lithography are currently explored. Irrespective of the technical viability of both approaches, one thing seems clear. They will be expensive .