Low-temperature growth of carbon nanotubes by plasma-enhanced chemical vapor deposition

@inproceedings{Hofmann2003LowtemperatureGO,
  title={Low-temperature growth of carbon nanotubes by plasma-enhanced chemical vapor deposition},
  author={Stephan Hofmann and Caterina Ducati and John Robertson and B. Kleinsorge},
  year={2003}
}
Vertically aligned carbon nanotubes were grown at temperatures as low as 120 °C by plasma-enhanced chemical vapor deposition. A systematic study of the temperature dependence of the growth rate and the structure of the as-grown nanotubes is presented using a C2H2/NH3 system and nickel as the catalyst. The activation energy for the growth rate was found to be 0.23 eV, much less than for thermal chemical vapor deposition (1.2–1.5 eV). This suggests growth occurs by surface diffusion of carbon on… CONTINUE READING

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