Low-loss one-dimensional photonic bandgap filter in (110) silicon.

Abstract

A free-space silicon one-dimensional photonic bandgap optical filter is designed and fabricated. A two-stage (110) wafer etching process is employed to form the extremely vertical, smooth, and high-aspect-ratio features that are essential for good optical properties. The (111) oriented planes of the wafer form <0.01 degrees off-vertical trenches that make up the Fabry-Perot filter. A simulation model is presented that analyzes the effect of verticality and predicts the measured spectrum well.

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Cite this paper

@article{Lipson2006LowlossOP, title={Low-loss one-dimensional photonic bandgap filter in (110) silicon.}, author={Ariel Lipson and Eric M. Yeatman}, journal={Optics letters}, year={2006}, volume={31 3}, pages={395-7} }