Low-loss amorphous silicon wire waveguide for integrated photonics: effect of fabrication process and the thermal stability.

@article{Zhu2010LowlossAS,
  title={Low-loss amorphous silicon wire waveguide for integrated photonics: effect of fabrication process and the thermal stability.},
  author={Shiyang Zhu and Guoqiang Lo and D. L. Kwong},
  journal={Optics express},
  year={2010},
  volume={18 24},
  pages={25283-91}
}
Hydrogenated amorphous silicon (a-Si:H) wire waveguides were fabricated by plasma-enhanced chemical vapor deposition and anisotropic dry etching. With the optimized fabrication process, the propagation losses of as low as 3.2 ± 0.2 dB/cm for the TE mode and 2.3 ± 0.1 dB/cm for the TM mode were measured for the 200 nm (height) × 500 nm (width) wire waveguides at 1550 nm using the standard cutback method. The loss becomes larger at shorter wavelength (~4.4 dB/cm for TE and ~5.0 dB/cm for TM at… CONTINUE READING
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