Low-k periodic mesoporous organosilica with air walls: POSS-PMO.


Periodic mesoporous organosilica (PMO) with polyhedral oligomeric silsesquioxane (POSS) air pockets integrated into the pore walls has been prepared by a template-directed, evaporation-induced self-assembly spin-coating procedure to create a hybrid POSS-PMO thin film. A 10-fold increase in the porosity of the POSS-PMO film compared to a reference POSS film… (More)
DOI: 10.1021/ja2080136


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@article{Seino2011LowkPM, title={Low-k periodic mesoporous organosilica with air walls: POSS-PMO.}, author={Makoto Seino and Wendong Wang and Jennifer E Lofgreen and Daniel P Puzzo and Takao Manabe and Geoffrey A Ozin}, journal={Journal of the American Chemical Society}, year={2011}, volume={133 45}, pages={18082-5} }