Low-k periodic mesoporous organosilica with air walls: POSS-PMO.

Abstract

Periodic mesoporous organosilica (PMO) with polyhedral oligomeric silsesquioxane (POSS) air pockets integrated into the pore walls has been prepared by a template-directed, evaporation-induced self-assembly spin-coating procedure to create a hybrid POSS-PMO thin film. A 10-fold increase in the porosity of the POSS-PMO film compared to a reference POSS film… (More)
DOI: 10.1021/ja2080136

Topics

4 Figures and Tables

Statistics

0102030201520162017
Citations per Year

Citation Velocity: 8

Averaging 8 citations per year over the last 3 years.

Learn more about how we calculate this metric in our FAQ.

Cite this paper

@article{Seino2011LowkPM, title={Low-k periodic mesoporous organosilica with air walls: POSS-PMO.}, author={Makoto Seino and Wendong Wang and Jennifer E Lofgreen and Daniel P Puzzo and Takao Manabe and Geoffrey A Ozin}, journal={Journal of the American Chemical Society}, year={2011}, volume={133 45}, pages={18082-5} }