Low energy ion assisted deposition of Ta/Cu films

@article{Quan2007LowEI,
  title={Low energy ion assisted deposition of Ta/Cu films},
  author={J. Quan and Xiaowang Zhou and Li He and R. Hull and H. Wadley},
  journal={Journal of Applied Physics},
  year={2007},
  volume={101},
  pages={024318}
}
A combination of molecular dynamics simulations and experiments has been used to investigate the use of various low energy ion assisted vapor deposition approaches for controlling the interfacial structures of a model copper∕tantalum multilayer system. Films were grown using argon ion beam assistance with either a fixed or modulated ion energy during metal deposition. The effect of sequential ion assistance (after layer’s deposition) was also investigated. The argon ion energy was varied… Expand
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