• DOI:10.1063/1.2430705
Corpus ID: 29711943

Low energy ion assisted deposition of Ta/Cu films

@article{Quan2007LowEI,
  title={Low energy ion assisted deposition of Ta/Cu films},
  author={J. Quan and Xiaowang Zhou and Li He and R. Hull and H. Wadley},
  journal={Journal of Applied Physics},
  year={2007},
  volume={101},
  pages={024318}
}

• J. Quan, Xiaowang Zhou, +2 authors H. Wadley
• Published 2007
• Physics
• Journal of Applied Physics

A combination of molecular dynamics simulations and experiments has been used to investigate the use of various low energy ion assisted vapor deposition approaches for controlling the interfacial structures of a model copper∕tantalum multilayer system. Films were grown using argon ion beam assistance with either a fixed or modulated ion energy during metal deposition. The effect of sequential ion assistance (after layer’s deposition) was also investigated. The argon ion energy was varied… Expand

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