Principles of Plasma Processing (Kluwer/Plenum
- F. F. Chen, J. P. Chang
- New York,
Radiofrequency discharges used in industry often have centrally peaked plasma density profiles n(r) although ionization is localized at the edge, even in the presence of a dc magnetic field. This can be explained with a simple cylindrical model in one dimension as long as the short-circuit effect at the endplates causes a Maxwellian electron distribution. Surprisingly, a universal profile can be obtained which is self-similar for all discharges with uniform electron temperature T e and neutral density n n. When all collisions and ionizations are radially accounted for, the ion drift velocity toward the wall reaches the Bohm velocity at a radius which can be identified with the sheath edge, thus obviating a pre-sheath calculation. For non-uniform T e and n n , the profiles change slightly but are always peaked on axis. For helicon discharges, iteration with the HELIC code for antenna-wave coupling yields profiles consistent with both energy deposition and diffusion profiles. Calculated density is in absolute-value agreement with experiment.