Lithography-Free Fabrication of Large Area Subwavelength Antireflection Structures Using Thermally Dewetted Pt/Pd Alloy Etch Mask

@inproceedings{Lee2009LithographyFreeFO,
  title={Lithography-Free Fabrication of Large Area Subwavelength Antireflection Structures Using Thermally Dewetted Pt/Pd Alloy Etch Mask},
  author={Youngjae Lee and Kisik Koh and Hyungjoo Na and Kwanoh Kim and Jeong-Jin Kang and Jongbaeg Kim},
  booktitle={Nanoscale research letters},
  year={2009}
}
We have demonstrated lithography-free, simple, and large area fabrication method for subwavelength antireflection structures (SAS) to achieve low reflectance of silicon (Si) surface. Thin film of Pt/Pd alloy on a Si substrate is melted and agglomerated into hemispheric nanodots by thermal dewetting process, and the array of the nanodots is used as etch mask for reactive ion etching (RIE) to form SAS on the Si surface. Two critical parameters, the temperature of thermal dewetting processes and… CONTINUE READING