• DOI:10.1109/5.915379
• Corpus ID: 56050386

Limits of lithography

@article{Harriott2001LimitsOL,
  title={Limits of lithography},
  author={Lloyd R. Harriott},
  journal={Proc. IEEE},
  year={2001},
  volume={89},
  pages={366-374}
}

• L. Harriott
• Published 1 March 2001
• Physics
• Proc. IEEE

Lithography technology has been one of the key enablers and drivers for the semiconductor industry for the past several decades. Improvements in lithography are responsible for roughly half of the improvement in cost per function in integrated circuit (IC) technology. The underlying reason for the driving force in semiconductor technology has been the ability to keep the cost for printing a silicon wafer roughly constant while dramatically increasing the number of transistors that can be printed per chip. ICs have always been printed optically with improvements in lens and imaging material technology along with decreases in wavelength used fueling the steady improvement of lithography technology. The end of optical lithography technology has been predicted by many and for many years. Many technologies have been proposed and developed to improve on the performance of optical lithography, but so far none has succeeded. This has been true largely because it has always been more economical to push incremental improvements in the existing optical technology rather than displace it with a new one. At some point in time, the costs for pushing optical lithography technology beyond previously conceived limits may exceed the cost of introducing new technologies. In this paper the author examines the limits of lithography and possible future technologies from both a technical and economic point of view.