Laser chemical process for clean applications of semiconductor manufacturing

@inproceedings{Yogev2000LaserCP,
  title={Laser chemical process for clean applications of semiconductor manufacturing},
  author={D. Yogev and M. Engel and S. Zeid and I. Barzilay and B. Livshits},
  booktitle={LASE},
  year={2000}
}
Cleaning applications in the semiconductor manufacturing industry are tougher to meet as the device dimensions decrease. The uniqueness of Oramir-Laser-Chemical process relies on the mutual combination and effectiveness of laser particle removal mechanisms and laser induced photon- thermal-chemical reaction in the mixture of O2/O3/NF3 gases. The process involves ozone blast wave, photodecomposition of O3 into O radicals, photo-thermal decomposition of NF3 into fluorine radicals, thermal effects… Expand

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