Langmuir Probe Diagnostics of DC Hollow Cathode Discharge During TiOx Deposition

@inproceedings{Leshkov2008LangmuirPD,
  title={Langmuir Probe Diagnostics of DC Hollow Cathode Discharge During TiOx Deposition},
  author={Sergey Leshkov and Pavel Kudrna and M. Chichina and I. Pickov{\'a} and Milan Tich{\'y}},
  year={2008}
}
Negative DC powered plasma jet system was investigated as a source for deposition of TiOx thin films on glass substrates. The reactor was constructed as a UHV chamber in order to achieve very clean and defined experimental conditions. Water cooled nozzle from pure Ti was used as source of scattered material. Ultimate pressure in the continuously pumped vacuum chamber was in the order of 10 Pa. Experiments were performed at typical pressure 20-80 Pa as in pure argon and argonoxygen physical… CONTINUE READING

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