Ionization by radio frequency inductively coupled plasma

@inproceedings{Rossnagel2000IonizationBR,
  title={Ionization by radio frequency inductively coupled plasma},
  author={Stevi Rossnagel},
  year={2000}
}
Publisher Summary This chapter examines the applications and directions in ionized physical vapor deposition (I-PVD). It is mostly based on the radio frequency (RF) inductively coupled plasma approach. The key applications of I-PVD in semiconductor technology rely on the intrinsic control of energy and directionality present with I-PVD. The most straightforward applications are the ones in which directionality has been attained in the past by passive means of PVD, such as collimated sputtering… CONTINUE READING

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