Investigation of H 2 : CH 4 Plasma Composition by Means of Spatially Resolved Optical Spectroscopy

@inproceedings{Bogdanowicz2009InvestigationOH,
  title={Investigation of H 2 : CH 4 Plasma Composition by Means of Spatially Resolved Optical Spectroscopy},
  author={Robert Bogdanowicz},
  year={2009}
}
The system based on spatially resolved optical emission spectroscopy dedicated for in situ diagnostics of plasma assisted CVD processes is presented in this paper. Measurement system coupled with chemical vapour deposition chamber by dedicated fiber-optic paths enables investigation of spatial distribution of species densities (Hx, H , CH, CH) during chemical vapour deposition process. Experiments were performed for a various gas inlet configuration at range of microwave power up to 800 W… CONTINUE READING
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