Interferometric lithography for nanoscale feature patterning: a comparative analysis between laser interference, evanescent wave interference, and surface plasmon interference.

@article{Sreekanth2010InterferometricLF,
  title={Interferometric lithography for nanoscale feature patterning: a comparative analysis between laser interference, evanescent wave interference, and surface plasmon interference.},
  author={Kandammathe Valiyaveedu Sreekanth and Jeun Kee Chua and Vadakke Matham Murukeshan},
  journal={Applied optics},
  year={2010},
  volume={49 35},
  pages={
          6710-7
        }
}
In this paper, we experimentally demonstrate and compare single-exposure multiple-beam interference lithography based on conventional laser interference, evanescent wave interference, and surface plasmon interference. The proposed two-beam and four-beam interference approaches are carried out theoretically and verified experimentally, employing the proposed configurations so as to realize the patterning of one- and two-dimensional periodic features on photoresists. A custom-fabricated grating… CONTINUE READING

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