Interference Lithography

  • Published 2002

Abstract

Interference lithography (IL) is the preferred method for fabricating periodic and quasi-periodic patterns that must be spatially coherent over large areas. IL is a conceptually simple process where two coherent beams interfere to produce a standing wave, which can be recorded in a photoresist. The spatial-period of the grating can be as fine as half the… (More)

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@inproceedings{2002InterferenceL, title={Interference Lithography}, author={}, year={2002} }