Interface morphology of Mo/Si multilayer systems with varying Mo layer thickness studied by EUV diffuse scattering.


We investigate the influence of the Mo-layer thickness on the EUV reflectance of Mo/Si mirrors with a set of unpolished and interface-polished Mo/Si/C multilayer mirrors. The Mo-layer thickness is varied in the range from 1.7 nm to 3.05 nm. We use a novel combination of specular and diffuse intensity measurements to determine the interface roughness… (More)
DOI: 10.1364/OE.25.015441