Integration Benefits of Carborane Molecular Implant for State-of-the-Art 28-nm Logic pFET Device Manufacturing


In this letter, for the first time, the integration benefits of a molecular carborane (CBH-C<sub>2</sub>B<sub>10</sub>H<sub>12</sub>) implant on a state-of-the-art 28-nm logic flow are demonstrated and discussed via advanced modeling. It is shown that, by integrating CBH, pLDD formation can be optimized to provide device benefits via profile/damage… (More)


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