Integrated Cleanroom Process for the Vapor-Phase Deposition of Large-Area Zeolitic Imidazolate Framework Thin Films

@article{Cruz2019IntegratedCP,
  title={Integrated Cleanroom Process for the Vapor-Phase Deposition of Large-Area Zeolitic Imidazolate Framework Thin Films},
  author={Alexander John Cruz and Ivo Stassen and Mikhail Krishtab and Kristof Marcoen and Timoth{\'e}e Stassin and Sabina Rodr{\'i}guez-Hermida and Joan Teyssandier and Sven Pletincx and Rhea Verbeke and V{\'i}ctor Rubio‐Gim{\'e}nez and Sergio Tatay and Carlos Martı́-Gastaldo and Johan Meersschaut and Philippe M. Vereecken and Steven De Feyter and Tom Hauffman and Rob Ameloot},
  journal={Chemistry of Materials},
  year={2019}
}
Robust and scalable thin film deposition methods are key to realize the potential of metal-organic frameworks (MOFs) in electronic devices. Here, we report the first integration of the chemical vapor deposition (CVD) of MOF coatings in a custom reactor within a cleanroom setting. As a test case, the MOF-CVD conditions for ZIF-8 are optimized to enable smooth, pinhole-free, and uniform thin films on full 200 mm wafers under mild conditions. The single-chamber MOF-CVD process and the impact of… 

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