Innovative approach to identify location of AMC source in cleanroom by inverse Computational Fluid Dynamics modeling

Abstract

Airborne Molecular Contamination (AMC) can cause serious impact on semiconductor manufacturing process. AMC source must be found and removed immediately once AMC level is detected high. Due to the complicated airflow circulation and contamination dispersion, the current methodology to detect the leak source for AMC removal is not effective. In the new… (More)

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