Initiated and oxidative chemical vapor deposition: a scalable method for conformal and functional polymer films on real substrates.


Chemical vapor deposition (CVD) is a widely-used technology for the preparation of conformal and defect-free inorganic thin films with systematically tunable properties. Polymers are a desirable class of materials for surface modification because of their low cost, wide array of chemical and physical functionality and mechanical flexibility. Initiated and… (More)
DOI: 10.1039/b900455f



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