Inhibition of Contamination of Ru-Capped Multilayer Mirrors for Extreme Ultraviolet Lithography Projection Optics by Ethanol

@inproceedings{Kakutani2007InhibitionOC,
  title={Inhibition of Contamination of Ru-Capped Multilayer Mirrors for Extreme Ultraviolet Lithography Projection Optics by Ethanol},
  author={Yukinobu Kakutani and Masahito Niibe and Yoshio Gomei and Hiromitsu Takase and Shigeru Terashima and Shuichi Matsunari and Takashi Aoki and Katsuhiko Murakami and Yasuaki Fukuda},
  year={2007}
}
The inhibition of the contamination of Ru-capped Mo/Si multilayer mirrors was systematically investigated by introducing ethanol into a controlled vacuum that mainly consisted of water vapor. Water vapor was introduced at a pressure of up to 1.3×10-5 Pa, which is a typical pressure in extreme ultraviolet (EUV) lithography production tools. Additionally, ethanol was introduced at several partial pressures ranging from 1.0×10-7 to 3.8×10-5 Pa. At the lowest ethanol pressure, the same degree of… CONTINUE READING