Influence of inert gas pressure on deposition rate during pulsed laser deposition

@article{Scharf2002InfluenceOI,
  title={Influence of inert gas pressure on deposition rate during pulsed laser deposition
},
  author={T. Scharf and H. Krebs},
  journal={Applied Physics A},
  year={2002},
  volume={75},
  pages={551-554}
}
Abstract.The deposition rates of permalloy and Ag are monitored during pulsed laser deposition in different inert gas atmospheres. Under ultrahigh vacuum conditions, resputtering from the film surface occurs due to the presence of energetic particles in the plasma plume. With increasing gas pressure, a reduction of the particle energy is accompanied with a decrease of resputtering and a rise in the deposition rate for materials with high sputtering yield. In contrast, at higher gas pressures… Expand
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