Influence of a-Si:H Deposition Temperature on Surface Passivation Property and Thermal Stability of a-Si:H/SiN$_{x}$:H Stack

Abstract

The inability to withstand temperatures much above the deposition temperature without significant degradation has limited the application of hydrogenated amorphous silicon (a-Si:H) for surface passivation. To address this limitation, in this paper, the surface passivation quality and thermal stability of a stack-passivating system, combining a layer of… (More)

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