Indium-tin oxide deposition by d.c. reactive sputtering on a low softening point material

@inproceedings{Kawada1990IndiumtinOD,
  title={Indium-tin oxide deposition by d.c. reactive sputtering on a low softening point material},
  author={Akihiro Kawada},
  year={1990}
}
  • Akihiro Kawada
  • Published 1990
  • Materials Science
  • Abstract The resistivities of indium-tin oxide (ITO) films produced by d.c. reactive magnetron sputtering and subsequently air baked were determined over a range of deposition rates and oxygen flow rates. The dependence of resistivity on deposition rate and oxygen flow rate of ITO sputtered film on glass formed a family of straight lines of constant resistivity emanating from the origin. These lines of constant resistivity were used to provide the form of the boundaries of the operating window… CONTINUE READING

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