Incorporation of sulfur into hydrogenated amorphous carbon films

@inproceedings{Filik2004IncorporationOS,
  title={Incorporation of sulfur into hydrogenated amorphous carbon films},
  author={Jacob Filik and Ian M Lane and Paul W May and Stuart J. Pearce and K. R. Hallama},
  year={2004}
}
Amorphous hydrogenated carbon–sulfur thin films (a-C:H:S) were deposited from CHyH S gas mixtures by capacitively4 2 coupled radio-frequency PECVD. X-ray photoelectron spectroscopy (XPS) and secondary ion mass spectrometry (SIMS) were used to probe the composition of the films. XPS showed that the sulfur atomic percentage within a film was proportional to the fraction of H S in the H SyCH gas mixture, and that films had been deposited with a sulfur content of up to 27 at.%. SIMS 2 2 4 showed… CONTINUE READING
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