Improvement of ultrathin polystyrene film stability by addition of poly(styrene-stat-chloromethylstyrene) copolymer: An atomic force microscopy study

@inproceedings{Sangjan2010ImprovementOU,
  title={Improvement of ultrathin polystyrene film stability by addition of poly(styrene-stat-chloromethylstyrene) copolymer: An atomic force microscopy study},
  author={Suntree Sangjan and Nisanart Traiphol and Rakchart Traiphol},
  year={2010}
}
  • Suntree Sangjan, Nisanart Traiphol, Rakchart Traiphol
  • Published 2010
  • Materials Science
  • Abstract A method to improve the stability of ultrathin polystyrene (PS) films on SiO x /Si substrate is introduced. In this method, interfacial interactions between PS film and substrate are enhanced by addition of poly(styrene- stat -chloromethylstyrene(ClMS)) copolymer containing 5 mol% of ClMS group. The resulting slight structural modification of the copolymer does not cause phase separation in the polymer blend. On the other hand, the existence of polar ClMS groups provides anchoring… CONTINUE READING

    Create an AI-powered research feed to stay up to date with new papers like this posted to ArXiv

    Citations

    Publications citing this paper.