Improvement of photolithography process by 2nd Generation Data Mining

@article{Tsuda2006ImprovementOP,
  title={Improvement of photolithography process by 2nd Generation Data Mining},
  author={Hayato Tsuda and Haruhiko Shirai},
  journal={2006 IEEE International Symposium on Semiconductor Manufacturing},
  year={2006},
  pages={122-125}
}
Advanced Process Control (APC) system has been developed and already been introduced about CD and overlay controls in photolithography process, and productivity and device performance have been improved. However, current APC is based on the inspection data where process deviation combined with machine fluctuation, and had the limit in the effect. The… CONTINUE READING