Improved Critical-Current-Density Uniformity by Using Anodization

@inproceedings{Nakada2001ImprovedCU,
  title={Improved Critical-Current-Density Uniformity by Using Anodization},
  author={Daniel Yuki Nakada and Karl K Berggren and E. Macedo and Vladimir Liberman and T. P. Orlando},
  year={2001}
}
We discuss an anodization technique for a Nb superconductive-electronics-fabrication process that results in an improvement in critical-current-density uniformity across a 150-mm-diameter wafer. We outline the anodization process and describe the metrology techniques used to determine the NbO thickness grown. In the work described, we performed critical current measurements on Josephson junctions distributed across a wafer. We then compared the uniformity of pairs of wafers, fabricated together… CONTINUE READING

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