Imprint Lithography with Sub-10 nm Feature Size and High Throughput


Nanoimprint lithography, a high-throughput, low-cost, nonconventional lithographic method proposed and demonstrated recently, has been developed and investigated. Nanoimprint lithography has demonstrated 10 nm feature size, 40 nm pitch, vertical and smooth sidewalls, and nearly 90 ° corners. Further experimental study indicates that the ultimate resolution… (More)

4 Figures and Tables



Citations per Year

67 Citations

Semantic Scholar estimates that this publication has 67 citations based on the available data.

See our FAQ for additional information.

  • Presentations referencing similar topics