Imprint Lithography with Sub-10 nm Feature Size and High Throughput

Abstract

Nanoimprint lithography, a high-throughput, low-cost, nonconventional lithographic method proposed and demonstrated recently, has been developed and investigated. Nanoimprint lithography has demonstrated 10 nm feature size, 40 nm pitch, vertical and smooth sidewalls, and nearly 90 ° corners. Further experimental study indicates that the ultimate resolution… (More)

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