Implementing and validating double patterning in 22-nm to 16-nm product design and patterning flows

@inproceedings{Noh2010ImplementingAV,
  title={Implementing and validating double patterning in 22-nm to 16-nm product design and patterning flows},
  author={Myung-Soo Noh and B. Seo and Suk-joo Lee and A. Miloslavsky and C. Cork and L. Barnes and K. Lucas},
  booktitle={Advanced Lithography},
  year={2010}
}
In double-patterning technology (DPT), we study the complex interactions of layout creation, physical design and design rule checking flows for the 22nm and 16nm device nodes. Decomposition includes the cutting (splitting) of original design-intent features into new overlapping polygons where required; and the coloring of all the resulting polygons into two mask layouts. We discuss the advantages of geometric distribution for polygon operations with the limited range of influence. Further, we… Expand
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