Implantation parameters affecting aluminum nano-particle formation in alumina

@article{Hunt2001ImplantationPA,
  title={Implantation parameters affecting aluminum nano-particle formation in alumina},
  author={E. M. Hunt and J. M. Hampikian},
  journal={Journal of Materials Science},
  year={2001},
  volume={36},
  pages={1963-1973}
}
The formation of nano-dimensional metallic Al precipitates in alumina due to the reduction of the host matrix as a result of ambient temperature ion implantation of Y ions is examined. The formation and growth of Al precipitates are dependent on both the Y ion dose and the energy available to the matrix, as reported here. Reducing the ion dose from 5 × 1016 to 2.5 × 1016 ions/cm2 results in smaller precipitates; 10.7 ± 1.8 nm to 9.0 nm ± 1.2 nm, respectively, for incident ion energies of 150… Expand
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References

SHOWING 1-10 OF 18 REFERENCES
Ion implantation-induced nanoscale particle formation in Al2O3 and SiO2 via reduction
Abstract A novel method for creating nano-dimensional metallic precipitates in oxide materials using the technology of ion implantation is reported. The reduction of single-crystalline alumina to AlExpand
Ion implantation induced formation of aluminum nanoparticles in alumina via reduction
Abstract Ion implantation of calcium and yttrium into high-purity, single crystalline α-alumina has resulted in the formation of metallic aluminum nanoparticles in the implanted regions. The calciumExpand
Formation and thermal stability of aluminium nanoparticles synthesized via yttrium ion implantation into sapphire
Yttrium ion implantation of 1 1 2 3 alumina resulted in the formation of metallic aluminium–yttrium, face centred cubic (a0=0.41 nm) spherical nanocrystals (∼ 12 nm in diameter) embedded in anExpand
Analytical electron microscopy of Al2O3 implanted with iron ions
Single crystals of α-Al2O3 were implanted with iron ions at room temperature to fluences ranging from 4×1016 Fe cm−2 to 1×1017 Fe cm−2. The microstructure and composition in the implanted region wereExpand
Changing the surface mechanical properties of silicon and α-Al2O3 by ion implantation
Microhardness indentation testing has been used as a means of introducing controlled localized deformation and fracture in both ion-implanted and unimplanted {1 1 1} silicon and {1 0 ¯1 2} sapphireExpand
Colloid formation in irradiated insulators
Abstract Irradiation of ionic crystals causes the displacement of lattice ions and the formation of primary defects in the form of vacancies and interstitials. At high temperatures when these defectsExpand
Formation of lithium colloids in electron-irradiated Li2O
Abstract Poly- and monocrystalline samples of Li2O were irradiated with 1 MeV electrons at different temperatures, Tirr, and their EPR spectra measured. The created defects manifest a strongExpand
Effect of silicon and niobium on oxidation resistance of TiAl intermetallics
Abstract The high temperature air oxidation of titanium aluminide intermetallics with small additions of silicon, niobium and a combination of silicon and niobium was studied in a temperature rangeExpand
The oxidation behaviour of NiAl-I. Phase transformations in the alumina scale during oxidation of NiAl and NiAl-Cr alloys
Abstract The oxide phases formed on NiAl and NiAl-Cr and their oxidation kinetics have been studied in the temperature range 973–1673 K using TGA, XRD, SEM and TEM. The oxidation rate depends on theExpand
Radiation damage in pure and helium-doped α-Al2O3 in the HVEM Qualitative aspects of void and aluminium colloid formation
Abstract Thick foils of α-Al2O3 single crystals of both high purity and doped with 1000 at. p.p.m. helium have been irradiated with 1 MV electrons at temperatures of 900–1130 K in a high-voltageExpand
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