Impact of gate area on plasma charging damage: the "reverse" antenna effect

@article{Krishnan2002ImpactOG,
  title={Impact of gate area on plasma charging damage: the "reverse" antenna effect},
  author={A. T. Krishnan and Srikanth Krishnan and Paul E. Nicollian},
  journal={Digest. International Electron Devices Meeting,},
  year={2002},
  pages={525-528}
}
We report for the first time, a peak in the failure fraction when plotted as a function of the gate area (for a fixed antenna area). This peak is a consequence of competition between failure probability decrease due to reducing antenna ratio and failure probability increase due to increasing gate area. The position of this peak depends on plasma/oxide parameters, and is likely to be more prevalent in damage arising from high-density plasma processes for ultra-thin dielectrics. The presence of… CONTINUE READING

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