Impact of RET on physical layouts

@inproceedings{Schellenberg2001ImpactOR,
  title={Impact of RET on physical layouts},
  author={Franklin M. Schellenberg and Luigi Capodieci},
  booktitle={ISPD},
  year={2001}
}
In this paper, we briefly describe the lithography developments known as RET (Resolution Enhancement Technologies), which include off-axis illumination in litho tools, Optical and Process Correction (OPC), and phase shifting masks (PSM). All of these techniques are adopted to allow ever smaller features to be reliably manufactured, and are being generally adopted in all manufacturing below 0.25 microns. However, their adoption also places certain restrictions on layouts. We explore these… CONTINUE READING