Hybrid scatterometry measurement for BEOL process control

@inproceedings{Timoney2017HybridSM,
  title={Hybrid scatterometry measurement for BEOL process control},
  author={P{\'a}draig Timoney and Alok Vaid and Byeong Cheol Kang and Haibo Liu and Paul K. Isbester and Marjorie Cheng and Susan Ng-Emans and Naren Yellai and Matt Sendelbach and Roy Koret and Oram Gedalia},
  booktitle={Advanced Lithography},
  year={2017}
}
Scaling of interconnect design rules in advanced nodes has been accompanied by a reducing metrology budget for BEOL process control. Traditional inline optical metrology measurements of BEOL processes rely on 1-dimensional (1D) film pads to characterize film thickness. Such pads are designed on the assumption that solid copper blocks from previous metallization layers prevent any light from penetrating through the copper, thus simplifying the effective film stack for the 1D optical model… CONTINUE READING

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