Hot New Beam May Zap Bandwidth Bottleneck

  title={Hot New Beam May Zap Bandwidth Bottleneck},
  author={Robert F. Service},
  pages={2454 - 2454}
  • R. Service
  • Published 21 December 2001
  • Medicine
  • Science

Topics from this paper

Control of charging in high aspect ratio plasma etching of integrated circuits
  • Z. Petrović, T. Makabe
  • Computer Science
    6th International Conference on Telecommunications in Modern Satellite, Cable and Broadcasting Service, 2003. TELSIKS 2003.
  • 2003
Property of incoming ions, geometry of the nanostructure, aspect ratio and plasma properties affect the kinetics of charging and this has a bearing in development of telecommunications.