High-throughput NGL electron-beam direct-write lithography system

@inproceedings{Parker2000HighthroughputNE,
  title={High-throughput NGL electron-beam direct-write lithography system},
  author={N. William Parker and Alan D. Brodie and John H. McCoy},
  booktitle={Advanced Lithography},
  year={2000}
}
Electron beam lithography systems have historically had low throughput. The only practical solution to this limitation is an approach using many beams writing simultaneously. For single-column multi-beam systems, including projection optics (SCALPELR and PREVAIL) and blanked aperture arrays, throughput and resolution are limited by space-charge effects. Multibeam micro-column (one beam per column) systems are limited by the need for low voltage operation, electrical connection density and… Expand
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