High resistance comparison among KRISS, VNIIM and NIM

@article{Yu2000HighRC,
  title={High resistance comparison among KRISS, VNIIM and NIM},
  author={Kwang Min Yu and Young Tae Park and Je Cheon Ryu and Kwon Su Han and Yu.P. Semenov and B I Litvinov and Shao Haiming},
  journal={Conference on Precision Electromagnetic Measurements. Conference Digest. CPEM 2000 (Cat. No.00CH37031)},
  year={2000},
  pages={68-69}
}
In a high resistance comparison among KRISS, VNIIM and NIM, the relative resistance values of measurement results agreed well within 2 ppm in 10 megohm and 5 ppm in 1 gigohm. Also, relative combined standard uncertainties of the three institutes is 4.9 ppm in 10 megohm and 11.6 ppm in 1 gigohm.