High-precision magnetic levitation stage for photolithography

@inproceedings{Kim1998HighprecisionML,
  title={High-precision magnetic levitation stage for photolithography},
  author={Won Jong Kim and David L. Trumper},
  year={1998}
}
In this paper, we present a high-precision magnetic levitation (maglev) stage for photolithography in semiconductor manufacturing. This stage is the world’s first maglev stage that provides fine six-degree-of-freedom motion controls and realizes large (50 mm 3 50 mm) planar motions with only a single magnetically levitated moving part. The key element of this stage is a linear motor capable of providing forces in both suspension and translation without contact. The advantage of such a stage is… CONTINUE READING
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