High-power laser-produced plasma source for nanolithography

@inproceedings{Forber2004HighpowerLP,
  title={High-power laser-produced plasma source for nanolithography},
  author={Richard A. Forber and Celestino John Gaeta and Harry Dipl Ing Rieger and Heinz Siegert and Scott C. Mcleod and Brent Edward Boerger},
  booktitle={SPIE Optics + Photonics},
  year={2004}
}
JMAR develops Laser-Produced Plasma (LPP) sources for lithography applications, and has specifically developed Collimated laser-Plasma Lithography (CPL) as a 1 nm collimated point source and stepper system to address sub-100nm lithography needs. We describe the CPL source development, show demonstrated sub-100nm printing capability, and describe status of a beta lithography tool. The system will be power-scaled to address silicon device contacts and vias at 90nm and below. This development has… CONTINUE READING

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