High performance Si/Si/sub 1-x/Gex resonant tunneling diodes

Abstract

Resonant tunneling diodes (RTDs) with strained i-Si/sub 0.4/Ge/sub 0.6/ potential barriers and a strained i-Si quantum well, all on a relaxed Si/sub 0.8/Ge/sub 0.2/ virtual substrate were successfully grown by ultra high vacuum compatible chemical vapor deposition and fabricated using standard Si processing methods. A large peak to valley current ratio of 2… (More)

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